Loading publications…
The last 5 uploaded publications
Red-Light-Active <i>N,C,N-</i>Pincer Bismuthinidene: Excited State Dynamics and Mechanism of Oxidative Addition into Aryl Iodides
Alexios Stamoulis, Mauro Mato, Paolo Cleto Bruzzese, Markus Leutzsch, Alejandro Cadranel, Marcos Gil‐Sepulcre, Frank Neese, Josep Cornellà (2025). Red-Light-Active <i>N,C,N-</i>Pincer Bismuthinidene: Excited State Dynamics and Mechanism of Oxidative Addition into Aryl Iodides. Journal of the American Chemical Society, DOI: 10.1021/jacs.4c16815.
Article169 days ago3-Center-3-Electron σ-Adduct Enables Silyl Radical Transfer below the Minimum Barrier for Silyl Radical Formation
Zihang Qiu, Paolo Cleto Bruzzese, Zikuan Wang, Hao Deng, Markus Leutzsch, Christophe Farès, Sonia Chabbra, Frank Neese, Alexander Schnegg, Constanze N. Neumann (2025). 3-Center-3-Electron σ-Adduct Enables Silyl Radical Transfer below the Minimum Barrier for Silyl Radical Formation. Journal of the American Chemical Society, DOI: 10.1021/jacs.4c18445.
Article169 days ago3-center-3-electron σ-Adduct Enables Silyl Radical Transfer Below the Minimum Barrier for Silyl Radical Formation
Zihang Qiu, Paolo Cleto Bruzzese, Zikuan Wang, Hao Deng, Markus Leutzsch, Christophe Farès, Sonia Chabbra, Frank Neese, Alexander Schnegg, Constanze N. Neumann (2024). 3-center-3-electron σ-Adduct Enables Silyl Radical Transfer Below the Minimum Barrier for Silyl Radical Formation. , DOI: 10.26434/chemrxiv-2024-dpqvv-v2.
Preprint169 days agoRed-light Active N,C,N-Pincer Bismuthinidene: Excited State Dynamics and Mechanism of Oxidative Addition into Aryl Iodides
Alexios Stamoulis, Mauro Mato, Paolo Cleto Bruzzese, Markus Leutzsch, Alejandro Cadranel, Marcos Gil‐Sepulcre, Frank Neese, Josep Cornellà (2024). Red-light Active N,C,N-Pincer Bismuthinidene: Excited State Dynamics and Mechanism of Oxidative Addition into Aryl Iodides. , DOI: 10.26434/chemrxiv-2024-x72vw.
Preprint169 days ago3-center-3-electron σ-Adduct Enables Silyl Radical Transfer Below the Minimum Barrier for Silyl Radical Formation
Zihang Qiu, Paolo Cleto Bruzzese, Zikuan Wang, Hao Deng, Markus Leutzsch, Christophe Farès, Sonia Chabbra, Frank Neese, Alexander Schnegg, Constanze N. Neumann (2024). 3-center-3-electron σ-Adduct Enables Silyl Radical Transfer Below the Minimum Barrier for Silyl Radical Formation. , DOI: 10.26434/chemrxiv-2024-dpqvv.
Preprint169 days ago