Amorphous Carbon Monolayer: A van der Waals Interface for High-Performance Metal Oxide Semiconductor Devices
Viswanath G. Akkili, Jongchan Yoon, Kihyun Shin, Jeong Sanghyun, Ji‐Yun Moon, Jun‐Hui Choi, Seung-Il Kim, Ashish A. Patil, Frederick Aziadzo, J.H. Kim, Su-Hyeon Kim, Dong‐Wook Shin, Jung‐Sub Wi, Hoon‐Hwe Cho, Joon Sik Park, Eui‐Tae Kim, Dong‐Eun Kim, Jaeyeong Heo, Graeme Henkelman, Konstantin ‘kostya’ Novoselov, Choong‐Heui Chung, Jae‐Hyun Lee, Zonghoon Lee, Sangyeob Lee (2024). Amorphous Carbon Monolayer: A van der Waals Interface for High-Performance Metal Oxide Semiconductor Devices. ACS Nano, DOI: 10.1021/acsnano.4c12780.
