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  5. Resistance Distances In Simplicial Networks

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Article
English
2022

Resistance Distances In Simplicial Networks

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English
2022
The Computer Journal
Vol 66 (8)
DOI: 10.1093/comjnl/bxac052

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Guanrong Chen
Guanrong Chen

City University Of Hong Kong

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Mingzhe Zhu
Wanyue Xu
Zhongzhi Zhang
+2 more

Abstract

It is well known that in many real networks, such as brain networks and scientific collaboration networks, there exist higher order nonpairwise relations among nodes, i.e. interactions between more than two nodes at a time. This simplicial structure can be described by simplicial complexes and has an important effect on topological and dynamical properties of networks involving such group interactions. In this paper, we study analytically resistance distances in iteratively growing networks with higher order interactions characterized by the simplicial structure that is controlled by a parameter $q$. We derive exact formulas for interesting quantities about resistance distances, including Kirchhoff index, additive degree-Kirchhoff index, multiplicative degree-Kirchhoff index, as well as average resistance distance, which have found applications in various areas elsewhere. We show that the average resistance distance tends to a $q$-dependent constant, indicating the impact of simplicial organization on the structural robustness measured by average resistance distance.

How to cite this publication

Mingzhe Zhu, Wanyue Xu, Zhongzhi Zhang, Haibin Kan, Guanrong Chen (2022). Resistance Distances In Simplicial Networks. The Computer Journal, 66(8), pp. 1922-1935, DOI: 10.1093/comjnl/bxac052.

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Publication Details

Type

Article

Year

2022

Authors

5

Datasets

0

Total Files

0

Language

English

Journal

The Computer Journal

DOI

10.1093/comjnl/bxac052

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