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Get Free AccessSilane and silane-like films were deposited from bis-1,2-(triethoxysilyl)ethane by vacuum and atmospheric plasma onto aluminium. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) was used for probing the aluminium/plasma polymer film interface. An AlOSi+ fragment was identified at nominal mass m/z =70.9539amu, indicating a strong chemical interaction (formation of a covalent bond) at the substrate/film interface. Until now, this strong silane–aluminium interaction has never been observed in plasma polymer BTSE films. Ageing tests in an ultrasonic water bath combined with X-ray photoelectron spectroscopy measurements allowed to indirectly confirm good adhesion, and therefore the formation of a chemical bond at the interface.
Abdelkrim Batan, N. Mine, Bastien Douhard, Fabiola Brusciotti, Iris De Graeve, J. Vereecken, Mireille Wenkin, M. Piens, Herman Terryn, J. J. Pireaux, François Reniers (2010). Evidence of covalent bond formation at the silane–metal interface during plasma polymerization of bis-1,2-(triethoxysilyl)ethane (BTSE) on aluminium. Chemical Physics Letters, 493(1-3), pp. 107-112, DOI: 10.1016/j.cplett.2010.05.002.
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Type
Article
Year
2010
Authors
11
Datasets
0
Total Files
0
Language
English
Journal
Chemical Physics Letters
DOI
10.1016/j.cplett.2010.05.002
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