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Get Free AccessThe multi-step photolithographic process involves expensive photoactive chemicals and equipment. Eliminating the photolithographic process will significantly re
Mary Pat Nicodemus, Jennifer Selvidge, Theresa E. Saenz, Darci Collins, John W. Hutchinson, Sara Collins, Myles A. Steiner, Owen Hildreth (2024). Development of Reactive Ink-Based Silicon Oxide Mask for Replacement of Photolithography in III-V Solar Cell Fabrication. , pp. 1709-1709, DOI: 10.1109/pvsc57443.2024.10748685.
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Type
Article
Year
2024
Authors
8
Datasets
0
Total Files
0
Language
English
DOI
10.1109/pvsc57443.2024.10748685
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