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  5. Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

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Article
English
2015

Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films

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0 Files

English
2015
Plasma Processes and Polymers
Vol 13 (5)
DOI: 10.1002/ppap.201500137

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Herman Terryn
Herman Terryn

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Gill Scheltjens
Gabriella Da Ponte
Sabine Paulussen
+5 more

Abstract

Allyl methacrylate (AMA), methyl methacrylate (MMA), and propyl isobutyrate (PiB) are plasma deposited at ambient temperature in an atmospheric DBD reactor to assess the effect of precursor carbon double bond unsaturations. The specific plasma deposition rate (k0) as a function of the Yasuda factor (Yf) is quantified empirically by: k0 = b (1 − exp(–a Yf/b)). Fourier transform infrared analysis indicates a loss of carbonyl functionalities with increasing plasma power, and Raman microscopy shows CC double bonds in all plasma films. The methacrylate-like plasma films are found to be heterogeneous with a volatile and a cross-linked fraction observed by thermogravimetric analysis. Differential scanning calorimetry reveals a low glass transition temperature and a characteristic residual reactivity of the coatings.

How to cite this publication

Gill Scheltjens, Gabriella Da Ponte, Sabine Paulussen, Iris De Graeve, Herman Terryn, François Reniers, Guy Van Assche, Bruno Van Mele (2015). Deposition Kinetics and Thermal Properties of Atmospheric Plasma Deposited Methacrylate-Like Films. Plasma Processes and Polymers, 13(5), pp. 521-533, DOI: 10.1002/ppap.201500137.

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Publication Details

Type

Article

Year

2015

Authors

8

Datasets

0

Total Files

0

Language

English

Journal

Plasma Processes and Polymers

DOI

10.1002/ppap.201500137

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