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Get Free AccessPatterning antidots ("voids") into well-defined antidot lattices creates an intriguing class of artificial structures for the periodic modulation of 2D electron systems, leading to anomalous transport properties and exotic quantum phenomena as well as enabling the precise bandgap engineering of 2D materials to address technological bottleneck issues. However, realizing such atomic-scale quantum antidots (QADs) is infeasible by current nanolithographic techniques. Here, we report an atomically-precise bottom-up fabrication of a series of atomic-scale QADs with elegantly engineered quantum states through a controllable assembly of a chalcogenide single vacancy (SV) in 2D PtTe2, a type-II Dirac semimetal. Te SVs as atomic-scale "antidots" undergo thermal migration and assembly into highly-ordered SV lattices spaced by a single Te atom, reaching the ultimate downscaling limit of antidot lattices. Increasing the number of SVs in QADs strengthens the cumulative repulsive potential and consequently enhances collective interference of multiple-pocket scattered quasiparticles inside QADs, creating multi-level quantum hole states with tunable gap from telecom to far-infrared regime. Moreover, precisely engineered quantum hole states of QADs are symmetry-protected and thus survive upon atom-by-atom oxygen substitutional doping. Therefore, SV-assembled QADs exhibit unprecedented robustness and property tunability, which not only holds the key to their future applications but also embody a wide variety of material technologies.
Hanyan Fang, Harshitra Mahalingam, Xinzhe Li, Xu Han, Zhizhan Qiu, Yixuan Han, Keian Noori, Dikshant Dulal, Hongfei Chen, Pin Lyu, Tianhao Yang, Jing Li, Chenliang Su, Wei Chen, Yongqing Cai, Antonio Castro H. Neto, Konstantin ‘kostya’ Novoselov, Aleksandr Rodin, Jiong Lu (2023). Atomically-precise Vacancy-assembled Quantum Antidots. arXiv (Cornell University), DOI: 10.48550/arxiv.2305.04088.
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Type
Preprint
Year
2023
Authors
19
Datasets
0
Total Files
0
Language
English
Journal
arXiv (Cornell University)
DOI
10.48550/arxiv.2305.04088
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